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Monday, October 16, 2006. Ion Implantation Process in Semiconductor Manufacturing. Main advantages of ion implantation in comparison to diffusion for the doping of semiconductors are. Short process times, good homogeneity and reproducibility of the profiles. Exact control of the amount of implanted ions by integrating the current. This is of particular importance for low concentrations, e.g. for adjusting the threshold voltage of MOS transistors. Relatively low temperatures during the process. Diffusi.CONTENT
This web page microchiptech.blogspot.com states the following, "Monday, October 16, 2006." We saw that the webpage said " Ion Implantation Process in Semiconductor Manufacturing." It also said " Main advantages of ion implantation in comparison to diffusion for the doping of semiconductors are. Short process times, good homogeneity and reproducibility of the profiles. Exact control of the amount of implanted ions by integrating the current. This is of particular importance for low concentrations, e. for adjusting the threshold voltage of MOS transistors. Relatively low temperatures during the process."SEEK SIMILAR DOMAINS
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