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Graphene Literature Reviews

Thursday, February 26, 2009. Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition. Alfonso Reina, Xiaoting Jia, John Ho, Daniel Nezich, Hyungbin Son, Vladimir Bulovic, Mildred S. Dresselhaus, Jing Kong 2009. Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition Nano Letters, 9. 1, 30-35 DOI 10.1021nl801827v. Around 90 in the 500-1000nm range. Onoff ratio at high voltage. Between 1.3 and 2. Mobility for es and holes. From Hum.
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Graphene Literature Reviews

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Thursday, February 26, 2009. Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition. Alfonso Reina, Xiaoting Jia, John Ho, Daniel Nezich, Hyungbin Son, Vladimir Bulovic, Mildred S. Dresselhaus, Jing Kong 2009. Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition Nano Letters, 9. 1, 30-35 DOI 10.1021nl801827v. Around 90 in the 500-1000nm range. Onoff ratio at high voltage. Between 1.3 and 2. Mobility for es and holes. From Hum.

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This web page graphenelitreviews.blogspot.com states the following, "Thursday, February 26, 2009." We saw that the webpage said " Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition." It also said " Alfonso Reina, Xiaoting Jia, John Ho, Daniel Nezich, Hyungbin Son, Vladimir Bulovic, Mildred S. Dresselhaus, Jing Kong 2009. Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition Nano Letters, 9. 1, 30-35 DOI 10. Around 90 in the 500-1000nm range. Onoff ratio at high voltage. Mobility for es and holes."

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