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CMMP Ellipsometry

Wednesday, June 22, 2011. Ellipsometry is an optical technique for determining the optical constants andor layer thicknesses of substrates, films and multilayers. Which and how many parameters can be simultaneously determined depends upon the type of experiment performed. The CMMP ellipsometer is what is called a nulling single wavelength ellipsometer. To the sample surface, and a p-component. What is measured in ellipsometry is the parameter, rho. As such, psi. Of the reflected radiation. delta. Are de.

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LINKS TO WEB SITE

CMMP Profilometry

Thursday, July 7, 2011. It will appear as if there is stylus instability. Monday, June 20, 2011. Using a 9429 A standard, it is 0. 74 um standard, it is 0. 13 um standard, it is -0. Thursday, June 16, 2011. Friday, June 10, 2011. The scanning profilometer is a complement to SEM. Fast; very large scan lengths; very larg.

CMMP SQUID Magnetometry

Thursday, August 15, 2013. Looking at sample moment as a function of time has significant limitations as the ability to see small changes in field is related to the sample mass and susceptibility, and the ability to see small changes over time is limited to the time it takes to do an extraction through the gradiometer. Monday, March 11, 2013. As discussed in a previous post.

CMMP X-ray Photo-electron Spectroscopy

Wednesday, June 11, 2014. In XPS, unlike Auger spectroscopy where the kinetic energy. Of electrons is presented, the binding energy. In this case, the kinetic energy of the photoelectrons is measured by the analyzer and then converted to binding energy by referencing to the energy of the X-ray excitation source.

CMMP X-ray Diffraction

Wednesday, March 19, 2014. Simple texture analysis is possibly by comparing coupled θ-2θ scans with a standard that is known to be without texture or preferred orientation. This probe of preferred orientation only addresses texture perpendicular to the sample surface, so a more in depth texture study will require a texture cradle. Tuesday, July 2, 2013. In high-temperature XRD the sample is glued to a Pt-ribbon that acts as the sample holder as well as heater using.

CMMP Magneto-Transport

Friday, October 25, 2013. One constraint is that samples must fit the 7 mm coaxial wave guide. Solid materials such as the telfon shown in this picture, can be machined to a 3 mm ID and 7 mm OD to tightly fit the coaxial guide. Deviations from the optimal ID and OD will require gap corrections. Powder samples need to be cast into torroids by mixing with wax or a resin.

CMMP User Facilities

Wednesday, October 1, 2014. Because of staffing limitations at the CMMP facility, services requiring CMMP staff may involve some delay. In general, services are provided on a first-come first-serve basis,. Users are encouraged to receive training if they intend on being regular users.

CMMP Scanning Electron Microscopy

Wednesday, January 7, 2015. In the second image, taken at 10 kV, small amorphous blobs of fused toner start to become visible, especially on some of the larger flat fibers. Tuesday, January 6, 2015. The final micrograph shows the edge of the tube at high tilt. The large depth of field at large working distance allows one to s.

CMMP Scanning Probe Microscopy

Wednesday, March 19, 2014. Grana membranes using tapping AFM with the Dimension 3000 AFM. OMCLAC160TS-W2, with 7 nm tip radius and. Monday, March 17, 2014. Sunday, August 12, 2012.

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CMMP Ellipsometry

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Wednesday, June 22, 2011. Ellipsometry is an optical technique for determining the optical constants andor layer thicknesses of substrates, films and multilayers. Which and how many parameters can be simultaneously determined depends upon the type of experiment performed. The CMMP ellipsometer is what is called a nulling single wavelength ellipsometer. To the sample surface, and a p-component. What is measured in ellipsometry is the parameter, rho. As such, psi. Of the reflected radiation. delta. Are de.

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This web page ellip-cmmp.blogspot.com states the following, "Wednesday, June 22, 2011." We saw that the webpage said " Ellipsometry is an optical technique for determining the optical constants andor layer thicknesses of substrates, films and multilayers." It also said " Which and how many parameters can be simultaneously determined depends upon the type of experiment performed. The CMMP ellipsometer is what is called a nulling single wavelength ellipsometer. To the sample surface, and a p-component. What is measured in ellipsometry is the parameter, rho."

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